温家慧 1,2朱美萍 1,2,3,*孙建 1李静平 1邵建达 1,2,3
作者单位
摘要
1 中国科学院上海光学精密机械研究所薄膜光学实验室, 上海201800
2 中国科学院大学材料科学与光电技术学院, 北京100049
3 国科大杭州高等研究院, 浙江 杭州310024
激光技术的不断发展对激光薄膜的光学性能、激光损伤阈值、机械性能等提出了越来越高的要求。具有低吸收损耗的激光薄膜在强激光、精密测量等领域有十分重要的应用。从电子束蒸发和离子束溅射沉积工艺、薄膜材料两个方面,对激光薄膜在吸收损耗控制方面的研究进展进行综述,详细介绍了制备过程中多个环节对薄膜吸收损耗的调控方法,以及单一材料和混合物薄膜的吸收机理、吸收调控方法。
薄膜 吸收损耗 混合材料 电子束蒸发 离子束溅射 
光学学报
2022, 42(7): 0700001
Author Affiliations
Abstract
1 Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
2 Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
3 Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, China
4 CREOL, The College of Optics and Photonics, University of Central Florida, Orlando, Florida 32816, USA
5 CAS Center for Excellence in Ultra-intense Laser Science, Shanghai 201800, China
6 e-mail: jdshao@siom.ac.cn
The requirements for dichroic laser mirrors continue to increase with the development of laser technology. The challenge of a dichroic laser mirror coating is to simultaneously obtain spectral performance with significantly different reflection or transmission properties as well as a high laser-induced damage threshold (LIDT) at two different wavelengths. Traditional dichroic laser mirrors composed of alternating high- and low-refractive-index pure materials often has difficulty achieving excellent spectral performance and high LIDTs at two wavelengths simultaneously. We propose to use a new design with mixture layers and sandwich-like-structure interfaces to meet the challenging requirements. An Al2O3-HfO2 mixture-based dichroic laser mirror, which can be used as a harmonic separator in a fusion-class laser or a pump/signal beam separator in a petawatt-class Ti-sapphire laser system, is experimentally demonstrated using e-beam deposition. The mixture-based dichroic mirror coating shows good spectral performance, fine mechanical property, low absorption, and high LIDT. For the s-polarized 7.7 ns pulses at a wavelength of 532 nm and the p-polarized 12 ns pulses at a wavelength of 1064 nm, the LIDTs are almost doubled. The excellent performance of this new design strategy with mixture layers and sandwich-like-structure interfaces suggests its wide applicability in high-performance laser coating.
Photonics Research
2021, 9(2): 02000229
作者单位
摘要
中国科学院上海光学精密机械研究所薄膜光学实验室, 上海 201800
从光谱性能、激光损伤阈值和膜层应力等方面综述了激光偏振薄膜的研究进展。简述了中国科学院上海光学精密机械研究所针对我国惯性约束聚变激光驱动装置对大尺寸偏振薄膜的要求,在镀膜材料选择、膜系设计、薄膜制备等方面的研究进展。所研制的大尺寸偏振薄膜已成功应用于我国神光系列高功率激光、超强超短激光等大型激光装置。
薄膜 偏振薄膜 高功率激光 光谱性能 激光损伤阈值 膜层应力 
光学学报
2019, 39(10): 1000001
Author Affiliations
Abstract
1 Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, No. 390, Qinghe Road, Jiading District, Shanghai 201800, China
2 Graduate School of Chinese Academy of Sciences, Beijing 100049, China
3 Shanghai Institute of Laser Plasma, Shanghai 201800, China
An in situ multi-beam optical sensor system was used to monitor and analyze the force per unit width (F/w) and stress evolution during several stages in magnetron-sputtered SiO2 and SiNx films. Stress was observed to relieve quickly after interrupt and recover rapidly after growth resumption in both films. Stress relief was reversible in SiO2 film but partial reversible in SiNx film. Stress relief results from both physical and chemical adsorption. Stress recovery is caused by physical desorption. And chemical adsorption results in an irreversible stress relief component. No chemical adsorption occurs in SiO2 film because of the stable chemical structure. The relationship between adsorption kinetics and films’ mechanical behavior is revealed.
Collection Of theses on high power laser and plasma physics
2013, 11(1): 034305
作者单位
摘要
1 中国科学院 上海光学精密机械研究所, 强激光材料重点实验室, 上海 201800
2 中国科学院大学, 北京 100049
3 中国工程物理研究院 上海激光等离子体所, 上海 201800
采用多光束应力实时测量装置监控并分析了磁控溅射Si和SiNx薄膜的总力及应力演化过程。在两种膜层中均观察到了应力释放及恢复现象。Si膜中应力是可逆的,而SiNx膜中应力是部分可逆的。物理吸附和解吸附分别是应力释放和恢复的主要原因。不可逆的应力分量来源于化学吸附,基于吸附机制建立了一个应力释放模型。
应力释放 应力恢复 物理吸附 化学吸附 stress relaxation stress recovery physical adsorption chemical adsorption 
强激光与粒子束
2013, 25(11): 2826
作者单位
摘要
中国科学院上海光学精密机械研究所, 上海 201800
用电子束蒸发沉积在K9玻璃基底上镀制HfO2薄膜,沉积温度为200 ℃,蒸发速率为0.03 nm/s。由X射线衍射谱可知薄膜出现明显结晶,且为单斜相和正交相混合结构,其中单斜相占明显优势。用Jade5软件分析得到单斜相HfO2的晶格常数a,b,c以及晶格矢量a和c之间的夹角β。基于得到的晶格常数建立了单斜相HfO2薄膜的晶体结构模型。同时建立固态单斜相HfO2的晶体结构模型进行对比。通过密度泛函理论(DFT)框架下的平面超软赝势法,采用两种不同的交换关联函数:局域密度近似(LDA)中的CA-PZ和广义梯度近似(GGA)中的质子平衡方程(PBE),计算了薄膜态和固态单斜晶相HfO2的弹性刚度系数矩阵Cij和弹性柔度系数矩阵Sij,Reuss模型、Voigt模型和Hill理论下的体积模量和剪切模量,材料平均杨氏模量和泊松比。此外还计算得到薄膜态和固态单斜晶相HfO2 在不同方向上的杨氏模量。
薄膜 单斜晶相 HfO2 薄膜 弹性常数 第一性原理 
光学学报
2013, 33(1): 0131001
作者单位
摘要
1 中国科学院上海光学精密机械研究所强激光材料重点实验室, 上海 201800
2 中国科学院研究生院, 北京 100049
3 上海激光等离子体所, 上海 201800
基于膜层结构的弛豫现象,建立了一个多晶膜的应力演化模型,并通过线性组合给出了复合膜的生长应力模型。利用双光束基底曲率测量装置实时测量了电子束蒸发氧化铪、氧化硅多晶膜及其复合膜的应力演化过程,并对测量结果进行了拟合分析。
薄膜 应力模型 多晶膜 复合膜 应力演化 
光学学报
2012, 32(10): 1031004

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